{"doi":"10.1149/1.2085683","title":"Shape of Thick Positive Photoresist Patterns","abstract":null,"journal":"Journal of The Electrochemical Society","year":1991,"id":680644,"datarank":0.24141568686511508,"base_score":1.6094379124341003,"endowment":1.6094379124341003,"self_citation_contribution":0.24141568686511508,"citation_network_contribution":0.0,"self_endowment_contribution":0.24141568686511508,"citer_contribution":0.0,"corpus_percentile":null,"corpus_rank":null,"citation_count":4,"citer_count":0,"citers_with_citation_signal":0,"citers_with_endowment":0,"datacite_reuse_total":0,"is_dataset":false,"is_dataset_confidence":null,"is_data_producer":false,"deposit_databanks":null,"is_oa":false,"file_count":0,"downloads":0,"has_version_chain":false,"published_date":null,"fair_score":null,"fair_percentile":null,"algorithm_id":"datarank_citation_only_1hop_v6","ranking_scope":"data_only","authors":[{"id":1778338,"name":"Tetsuo Ito","orcid":null,"position":1,"is_corresponding":false},{"id":1778339,"name":"Moriaki Fuyama","orcid":null,"position":2,"is_corresponding":false},{"id":1778340,"name":"Shinji Narishige","orcid":null,"position":3,"is_corresponding":false},{"id":1778337,"name":"Takashi Kawabe","orcid":null,"position":0,"is_corresponding":false}],"reference_count":0,"raw_metadata":{"has_enrichment":true,"resolved":true,"title":"Shape of Thick Positive Photoresist Patterns","abstract":"The shape and the sidewall taper angle of positive photoresist patterns 2–5 μm in width and 1.5–9.3 μm in thickness were investigated to achieve a steep sidewall profile. Both experimental and calculated results showed that the taper angle increases with increased coated photoresist thickness, because the exposure dose is low at the bottom of a rather thick photoresist. The sidewall taper angle of a photoresist pattern 5 μm wide and 9.3 μm thick reached 84° when using inorganic alkaline developer. The taper angles simulated by sample agreed with the experimental results within one degree.","is_dataset_classified":null,"base_score":1.6094379124341003,"endowment":1.6094379124341003,"datacite_reuse_total":0,"file_count":0,"downloads":0,"views":0,"has_version_chain":false,"is_dataset":false,"is_oa":false,"pmid":"21097893","pmcid":null,"openalex_id":"https://openalex.org/W1966978432","authors":[],"funders":[],"total_grants":0,"fwci":0.0,"citation_percentile":0.06317525,"influential_citations":0,"citation_trend":[{"year":2025,"count":1}],"oa_status":"bronze","license":"https://iopscience.iop.org/info/page/text-and-data-mining","oa_locations":[{"url":"https://iopscience.iop.org/article/10.1149/1.2085683/pdf","host_type":"journal"},{"url":"https://iopscience.iop.org/article/10.1149/1.2085683/pdf","host_type":"BRONZE"},{"url":"https://iopscience.iop.org/article/10.1149/1.2085683/pdf","host_type":"publisher"},{"url":"https://iopscience.iop.org/article/10.1149/1.2085683","host_type":"publisher"},{"url":"https://doi.org/10.1149/1.2085683","host_type":"journal"}],"fields_of_study":["Advancements in Photolithography Techniques","Advanced Surface Polishing Techniques","Surface Roughness and Optical Measurements","Chemistry","Materials Science"],"mesh_terms":[],"keywords":["Photoresist","Materials science","Optics","Resist","Composite material","Aspect ratio (aeronautics)","Physics","Layer (electronics)"],"sdg_mappings":[],"linked_datasets":[],"clinical_trials":[],"software_tools":[],"database_accessions":[],"source":"live","citation_network_status":"fetched"},"created_at":"2026-08-17T15:43:01.449098Z","pmid":null,"pmcid":null,"fwci":null,"citation_percentile":null,"influential_citations":0,"oa_status":null,"license":null,"views":0,"total_file_size_bytes":0,"version_count":0,"fair_f":null,"fair_a":null,"fair_i":null,"fair_r":null,"fair_zscore":null,"fair_rationale":null,"fair_model":null,"fair_agent_version":null,"fair_fulltext_source":null,"fair_has_llm":null,"fair_computed_at":null,"clinical_trials":[],"software_tools":[],"db_accessions":[],"linked_datasets":[],"topics":[]}