{"doi":"10.1117/12.20150","title":"Target x-ray source lithography and photolithography mixed and match system","abstract":null,"journal":"SPIE Proceedings","year":1990,"id":47020,"datarank":0.0,"base_score":0.0,"endowment":0.0,"self_citation_contribution":0.0,"citation_network_contribution":0.0,"self_endowment_contribution":0.0,"citer_contribution":0.0,"corpus_percentile":null,"corpus_rank":null,"citation_count":0,"citer_count":0,"citers_with_citation_signal":0,"citers_with_endowment":0,"datacite_reuse_total":0,"is_dataset":false,"is_dataset_confidence":null,"is_data_producer":false,"deposit_databanks":null,"is_oa":false,"file_count":0,"downloads":0,"has_version_chain":false,"published_date":null,"fair_score":null,"fair_percentile":null,"algorithm_id":"datarank_citation_only_1hop_v6","ranking_scope":"data_only","authors":[{"id":217221,"name":"Shinzo Morita","orcid":null,"position":1,"is_corresponding":false},{"id":217222,"name":"Akihiro Yoshida","orcid":null,"position":2,"is_corresponding":false},{"id":217223,"name":"Tsutomu Nomura","orcid":null,"position":3,"is_corresponding":false},{"id":217224,"name":"Takashi Tagawa","orcid":null,"position":4,"is_corresponding":false},{"id":217225,"name":"Hideshi Yoshikawa","orcid":null,"position":5,"is_corresponding":false},{"id":217220,"name":"Shuzo Hattori","orcid":null,"position":0,"is_corresponding":false}],"reference_count":0,"raw_metadata":{"has_enrichment":true,"resolved":true,"title":"Target x-ray source lithography and photolithography mixed and match system","abstract":"Target X-ray source lithography and photo lithography mixed and match system was proposed for an effective lithography system. The key technology for the system is a projection moire alignment, whose marks are used for both photo and X-ray lithography. In order to realize the systeimi, related technologies and apparatus are developing, which are photo and X-ray stepper, Xray source of radiation cooled slotted Pd target, X-ray mask and X-ray mask inspection system.","is_dataset_classified":null,"base_score":0.0,"endowment":0.0,"datacite_reuse_total":0,"file_count":0,"downloads":0,"views":0,"has_version_chain":false,"is_dataset":false,"is_oa":false,"pmid":"18998783","pmcid":null,"openalex_id":"https://openalex.org/W2050411782","authors":[],"funders":[],"total_grants":0,"fwci":0.0,"citation_percentile":0.15668375,"influential_citations":0,"citation_trend":[],"oa_status":"closed","license":null,"oa_locations":[{"url":"https://doi.org/10.1117/12.20150","host_type":"journal"}],"fields_of_study":["Advancements in Photolithography Techniques","Medical Imaging Techniques and Applications","Optical Systems and Laser Technology","Materials Science","Engineering","Physics"],"mesh_terms":[],"keywords":["Lithography","Stepper","X-ray lithography","Photolithography","Computational lithography","Extreme ultraviolet lithography","Next-generation lithography","Optics","Maskless lithography","Projection (relational algebra)","Resist","Materials science","Optoelectronics","Computer science","Electron-beam lithography","Physics","Nanotechnology"],"sdg_mappings":[],"linked_datasets":[],"clinical_trials":[],"software_tools":[],"database_accessions":[],"source":"live","citation_network_status":"fetched"},"created_at":"2026-07-15T05:14:24.389210Z","pmid":null,"pmcid":null,"fwci":null,"citation_percentile":null,"influential_citations":0,"oa_status":null,"license":null,"views":0,"total_file_size_bytes":0,"version_count":0,"fair_f":null,"fair_a":null,"fair_i":null,"fair_r":null,"fair_zscore":null,"fair_rationale":null,"fair_model":null,"fair_agent_version":null,"fair_fulltext_source":null,"fair_has_llm":null,"fair_computed_at":null,"clinical_trials":[],"software_tools":[],"db_accessions":[],"linked_datasets":[],"topics":[]}