{"doi":"10.1021/nl049345w","title":"Sub-100 nm Triangular Nanopores Fabricated with the Reactive Ion Etching Variant of Nanosphere Lithography and Angle-Resolved Nanosphere Lithography","abstract":null,"journal":"Nano Letters","year":2004,"id":589603,"datarank":9.919223715699399,"base_score":4.912654885736052,"endowment":4.912654885736052,"self_citation_contribution":0.736898232860408,"citation_network_contribution":9.18232548283899,"self_endowment_contribution":0.736898232860408,"citer_contribution":9.18232548283899,"corpus_percentile":null,"corpus_rank":null,"citation_count":135,"citer_count":132,"citers_with_citation_signal":127,"citers_with_endowment":127,"datacite_reuse_total":0,"is_dataset":false,"is_dataset_confidence":null,"is_data_producer":false,"deposit_databanks":null,"is_oa":false,"file_count":0,"downloads":0,"has_version_chain":false,"published_date":null,"fair_score":null,"fair_percentile":null,"algorithm_id":"datarank_citation_only_1hop_v6","ranking_scope":"data_only","authors":[{"id":1508504,"name":"Benjamin D. Myers","orcid":null,"position":1,"is_corresponding":false},{"id":347332,"name":"Richard P. Van Duyne","orcid":"0000-0001-8861-2228","position":2,"is_corresponding":false},{"id":1508503,"name":"Alyson V. Whitney","orcid":null,"position":0,"is_corresponding":false}],"reference_count":0,"raw_metadata":{"has_enrichment":true,"resolved":true,"title":"Sub-100 nm Triangular Nanopores Fabricated with the Reactive Ion Etching Variant of Nanosphere Lithography and Angle-Resolved Nanosphere Lithography","abstract":"Nanosphere lithography (NSL) is combined with reactive ion etching (RIE) to fabricate ordered arrays of in-plane, triangular cross-section nanopores. Nanopores with in-plane widths ranging from 44 to 404 nm and depths ranging from 25 to 250 nm are demonstrated. The combination of angle-resolved nanosphere lithography (AR NSL) and RIE yields an additional three-fold reduction in nanopore size.","is_dataset_classified":null,"base_score":4.912654885736052,"endowment":4.912654885736052,"datacite_reuse_total":0,"file_count":0,"downloads":0,"views":0,"has_version_chain":false,"is_dataset":false,"is_oa":false,"pmid":"26657633","pmcid":null,"openalex_id":"https://openalex.org/W2142261580","authors":[],"funders":[],"total_grants":0,"fwci":8.2366,"citation_percentile":0.98060147,"influential_citations":0,"citation_trend":[{"year":2012,"count":9},{"year":2013,"count":9},{"year":2014,"count":3},{"year":2015,"count":10},{"year":2016,"count":9},{"year":2017,"count":7},{"year":2018,"count":11},{"year":2019,"count":7},{"year":2020,"count":3},{"year":2021,"count":2},{"year":2022,"count":3},{"year":2023,"count":3},{"year":2024,"count":2},{"year":2025,"count":1},{"year":2026,"count":1}],"oa_status":"closed","license":null,"oa_locations":[{"url":"https://pubs.acs.org/doi/pdf/10.1021/nl049345w","host_type":"publisher"},{"url":"https://doi.org/10.1021/nl049345w","host_type":"journal"}],"fields_of_study":["Nanopore and Nanochannel Transport Studies","Advanced biosensing and bioanalysis techniques","Ion-surface interactions and analysis"],"mesh_terms":[],"keywords":["Nanosphere lithography","Nanopore","Reactive-ion etching","Lithography","Materials science","Etching (microfabrication)","Nanotechnology","Next-generation lithography","Nanostructure","Optoelectronics","Electron-beam lithography","Resist","Fabrication","Layer (electronics)"],"sdg_mappings":[],"linked_datasets":[],"clinical_trials":[],"software_tools":[],"database_accessions":[],"source":"live","citation_network_status":"fetched"},"created_at":"2026-07-23T23:17:07.663284Z","pmid":null,"pmcid":null,"fwci":null,"citation_percentile":null,"influential_citations":0,"oa_status":null,"license":null,"views":0,"total_file_size_bytes":0,"version_count":0,"fair_f":null,"fair_a":null,"fair_i":null,"fair_r":null,"fair_zscore":null,"fair_rationale":null,"fair_model":null,"fair_agent_version":null,"fair_fulltext_source":null,"fair_has_llm":null,"fair_computed_at":null,"clinical_trials":[],"software_tools":[],"db_accessions":[],"linked_datasets":[],"topics":[]}