{"doi":"10.1021/nl0258473","title":"Fabrication of Sub-50-nm Solid-State Nanostructures on the Basis of Dip-Pen Nanolithography","abstract":null,"journal":"Nano Letters","year":2003,"id":27910,"datarank":7.672806119162949,"base_score":5.117993812416755,"endowment":5.117993812416755,"self_citation_contribution":0.7676990718625134,"citation_network_contribution":6.905107047300436,"self_endowment_contribution":0.7676990718625134,"citer_contribution":6.905107047300436,"corpus_percentile":null,"corpus_rank":null,"citation_count":166,"citer_count":139,"citers_with_citation_signal":122,"citers_with_endowment":122,"datacite_reuse_total":0,"is_dataset":false,"is_dataset_confidence":null,"is_oa":false,"file_count":0,"downloads":0,"has_version_chain":false,"published_date":null,"algorithm_id":"datarank_citation_only_1hop_v6","ranking_scope":"data_only","authors":[{"id":157753,"name":"Sung-Wook Chung","orcid":null,"position":1,"is_corresponding":false},{"id":79412,"name":"Chad A. Mirkin","orcid":"0000-0002-6634-7627","position":2,"is_corresponding":false},{"id":61911,"name":"Hua Zhang","orcid":"0000-0001-8514-0958","position":0,"is_corresponding":false}],"reference_count":0,"raw_metadata":{"has_enrichment":true,"base_score":5.117993812416755,"endowment":5.117993812416755,"datacite_reuse_total":0,"file_count":0,"downloads":0,"views":0,"has_version_chain":false,"is_dataset":false,"is_oa":false,"pmid":"24523987","pmcid":null,"openalex_id":"https://openalex.org/W1979069790","authors":[],"funders":[],"total_grants":0,"fwci":9.2985,"citation_percentile":0.98556105,"influential_citations":1,"citation_trend":[{"year":2012,"count":10},{"year":2013,"count":4},{"year":2014,"count":5},{"year":2015,"count":4},{"year":2016,"count":5},{"year":2017,"count":5},{"year":2018,"count":2},{"year":2019,"count":3},{"year":2020,"count":1},{"year":2021,"count":4},{"year":2022,"count":1},{"year":2023,"count":1}],"oa_status":"closed","license":null,"oa_locations":[{"url":"https://pubs.acs.org/doi/pdf/10.1021/nl0258473","host_type":"publisher"},{"url":"https://doi.org/10.1021/nl0258473","host_type":"journal"},{"url":"http://hdl.handle.net/10220/8574","host_type":"repository"}],"fields_of_study":["Nanofabrication and Lithography Techniques","Force Microscopy Techniques and Applications","Nanowire Synthesis and Applications","Materials Science","Engineering","Physics"],"mesh_terms":[],"keywords":["Nanolithography","Dip-pen nanolithography","Fabrication","Nanotechnology","Etching (microfabrication)","Resist","Materials science","Nanostructure","Lithography","Solid-state","Isotropic etching","Optoelectronics","Chemistry","Layer (electronics)"],"sdg_mappings":[],"linked_datasets":[],"clinical_trials":[],"software_tools":[],"database_accessions":[],"source":"live","citation_network_status":"fetched"},"created_at":"2026-06-08T19:54:04.628218Z","pmid":null,"pmcid":null,"fwci":null,"citation_percentile":null,"influential_citations":0,"oa_status":null,"license":null,"views":0,"total_file_size_bytes":0,"version_count":0,"clinical_trials":[],"software_tools":[],"db_accessions":[],"linked_datasets":[],"topics":[]}